Investigation of the Effect of Over-Etching During Color Etching

Abstract During color etching, the examined grain structure undergoes a continuous, cyclic change. This phenomenon is accompanied by continuous loss of light intensity reflected from surface. If etching process not stopped in time, surface will be over etched. As result, separability individual grains greatly damaged, which can lead to significant information. It was investigated how determine moment over-etching for each grain. in-situ observation time at particle considered etched determined measuring luminance normalized initial state.